Large Magnetoresistance in a Si-Based Double-Tunnel Junction with Purely Organic Radical Molecules (Nano Letters)

J. Bera, T. S. Basu, J. Wolf, H. Zhang, K. Marumoto, Y. Wakayama, C. Herrmann, T. Huhn and R. Hayakawa,

“Large Magnetoresistance in a Si-Based Double-Tunnel Junction with Purely Organic Radical Molecules”,

Nano Letters 26 (2026) 8257-8264. (DOI:10.1021/acs.nanolett.6c01526)