Control of hole concentration in sputter-deposited BaSi2 films by B implantation and operation of B-implanted p-BaSi2/n-Si heterojunction solar cells (Materials Science in Semiconductor Processing)
T. Sato, S. Aonuki, H. Takenaka, R. Du, K. Kido, H. Hasebe, S. Narita, Y. Koda, M. Mesuda, K. Toko, and T. Suemasu,
“Control of hole concentration in sputter-deposited BaSi2 films by B implantation and operation of B-implanted p-BaSi2/n-Si heterojunction solar cells”,
Materials Science in Semiconductor Processing 175 (2025) 108296. (DOI: 10.1016/j.mssp.2024.108296)
投稿日：2024年6月1日